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Eric Garfunkel - Publications

Selected Publications

Aleksandra B. Biedron, Eric L. Garfunkel, Edward W. Castner Jr., and Sylvie Rangan; Ionic liquid ultrathin films at the surface of Cu(100) and Au(111); The Journal of Chemical Physics 146, 054704 (2017) Link
Paul F. Smith, Benjamin J. Deibert, Shivam Kaushik, Graeme Gardner, Shinjae Hwang, Hao Wang, Jafar F. Al-Sharab, Eric Garfunkel, Laura Fabris, Jing Li, and G. Charles Dismukes; Coordination Geometry and Oxidation State Requirements of Corner-Sharing MnO6 Octahedra for Water Oxidation Catalysis: An Investigation of Manganite (γ-MnOOH); ACS Catalysis Research Article DOI: 10.1021/acscatal.6b00099 ACS Catal. 2016, 6, 2089−2099 Link
Feixiang Luo, Viacheslav Manichev, Mengjun Li, Gavin Mitchson, Boris Yakshinskiy, Torgny Gustafsson, David Johnson, and Eric Garfunkel; Helium ion beam lithography (HIBL) using HafSOx as the resist; Proc. of SPIE Vol. 9779, doi: 10.1117/12.2219239 Link
Sylvie Rangan, Malathi Kalyanikar, Junxi Duan, Gang Liu, Robert Allen Bartynski, Eva Y. Andrei, Leonard Feldman, and Eric Garfunkel; Nanoscale Internal Fields in a Biased Graphene−Insulator−Semiconductor Structure; J. Phys. Chem. Lett. 2016, 7, 3434−3439 Link
Kurtis C. Fairley, Devin R. Merrill, Keenan N. Woods, Jeffrey Ditto, Can Xu, Richard P. Oleksak, Torgny Gustafsson, Darren W. Johnson, Eric L. Garfunkel, Gregory S. Herman, David C. Johnson, and Catherine J. Page; Non-uniform Composition Profiles in Inorganic Thin Films from Aqueous Solutions; ACS Appl. Mater. Interfaces 2016, 8, 667−672 Link
Mehulkumar A. Patel, Feixiang Luo, M. Reza Khoshi, Emann Rabie, Qing Zhang, Carol R. Flach, Richard Mendelsohn, Eric Garfunkel, Michal Szostak, and Huixin He; P‑Doped Porous Carbon as Metal Free Catalysts for Selective Aerobic Oxidation with an Unexpected Mechanism; ACS Nano 2016, 10, 2305−2315 Link
Feng Hu, Mehulkumar Patel, Feixiang Luo, Carol Flach, Richard Mendelsohn, Eric Garfunkel, Huixin He, and Michal Szostak; Graphene-Catalyzed Direct Friedel–Crafts Alkylation Reactions: Mechanism, Selectivity, and Synthetic Utility; J. Am. Chem. Soc., 2015, 137 (45), pp 14473–14480; DOI: 10.1021/jacs.5b09636. Link
Keerthi Savaram, Malathi Kalyanikar, Mehulkumar Patel, Roman Brukh, Carol R. Flach, Ruiming Huang, M. Reza Khoshi, Richard Mendelsohn, Andrew Wang, Eric Garfunkel and Huixin He; Synergy of oxygen and a piranha solution for eco-friendly production of highly conductive graphene dispersions; Green Chem., 2015,17, 869-881; DOI: 10.1039/C4GC01752H. Link
Jeremy T. Anderson, Wei Wang, Kai Jiang, Torgny Gustafsson, Can Xu, Eric L. Gafunkel, and Douglas A. Keszler; Chemically Amplified Dehydration of Thin Oxide Films; ACS Sustainable Chem. Eng., 2015, 3 (6), pp 1081–1085; DOI: 10.1021/sc500824a. Link
Y. Xu, C. Xu, G. Liu, H. D. Lee, S. M. Shubeita, C. Jiao, A. Modic, A. C. Ahyi, Y. Sharma, A. Wan, J. R. Williams, T. Gustafsson, S. Dhar, E. L. Garfunkel, and L. C. Feldman; Concentration, chemical bonding, and etching behavior of P and N at the SiO2/SiC(0001) interface, Journal of Applied Physics, (2015), 118, 235303. Link
Mehulkumar Patel, Wenchun Feng, Keerthi Savaram, M. Reza Khoshi, Ruiming Huang, Jing Sun, Emann Rabie, Carol Flach, Richard Mendelsohn, Eric Garfunkel, and Huixin He; Microwave Enabled One-Pot, One-Step Fabrication and Nitrogen Doping of Holey Graphene Oxide for Catalytic Applications, Small, (2015), 11, No. 27, 3358–3368. Link
Srijata Sarkar, Lin Zhang, Prasad Subramaniam, Ki-Bum Lee, Eric Garfunkel, Pamela A. Ohman Strickland, Gediminas Mainelis, Paul J. Lioy, Teresa D. Tetley, Kian Fan Chung, Junfeng Zhang, Mary Ryan, Alex Porter, and Stephan Schwander; Variability in Bioreactivity Linked to Changes in Size and Zeta Potential of Diesel Exhaust Particles in Human Immune Cells, PLOS ONE, May (2014), Volume 9, Issue 5, e97304. Link
Daniel D. T. Mastrogiovanni, Jeff Mayer, Alan S. Wan, Aleksey Vishnyakov, Alexander V. Neimark, Vitaly Podzorov, Leonard C. Feldman, and Eric Garfunkel; Oxygen Incorporation in Rubrene Single Crystals, Nature Scientific Reports, 4, 4753 (2014); DOI:10.1038/srep04753. Link
W. Feng, S. Rangan, Y. Cao, E. Galoppini, R. A. Bartynski, and E. Garfunkel; Energy level alignment of polythiophene/ZnO hybrid solar cells, Journal of Materials Chemistry A, 2014, 2, 7034-7044. Link
Y. Xu, X. Zhu, H. D. Lee, C. Xu, S. M. Shubeita, A. C. Ahyi, Y. Sharma, J. R. Williams, W. Lu, S. Ceesay, B. R. Tuttle, A. Wan, S. T. Pantelides, T. Gustafsson, E. L. Garfunkel, and L. C. Feldman; Atomic state and characterization of nitrogen at the SiC/SiO2 interface, Journal of Applied Physics, 115, 033502, (2014). Link
Richard P. Oleksak, Rose E. Ruther, Feixiang Luo, Kurtis C. Fairley, Shawn R. Decker, William F. Stickle, Darren W. Johnson, Eric L. Garfunkel, Gregory S. Herman, and Douglas A. Keszler; Chemical and Structural Investigation of High-Resolution Patterningwith HafSOx, ACS Applied Materials & Interfaces, (2014), 6, 2917−2921. Link
Mehulkumar A. Patel, Hao Yang, Pui Lam Chiu, Daniel D. T. Mastrogiovanni, Carol R. Flach, Keerthi Savaram, Lesly Gomez, Ashley Hemnarine, Richard Mendelsohn, Eric Garfunkel, Huabei Jiang, and Huixin He; Direct Production of Graphene Nanosheets for Near Infrared Photoacoustic Imaging, ACS Nano, Vol. 7, No. 9, 8147-8157, (2013). Link
Junfeng Zhang, Yevgen Nazarenko, Lin Zhang, Leonardo Calderon, Ki-Bum Lee, Eric Garfunkel, Stephan Schwander, Teresa D. Tetley, Kian Fan Chung, Alexandra E. Porter, Mary Ryan, Howard Kipen, Paul J. Lioy, and Gediminas Mainelis; Impacts of a Nanosized Ceria Additive on Diesel Engine Emissions of Particulate and Gaseous Pollutants, Environmental Science & Technology, (2013), 47, 13077−13085. Link
Wenchun Feng, Alan S. Wan, and Eric Garfunkel; Interfacial Bonding and Morphological Control of Electropolymerized Polythiophene Films on ZnO, dx.doi.org/10.1021/jp400871g | J. Phys. Chem. C, (2013), 117, 9852−9863. Link
Y. K. Sharma, A. C. Ahyi, T. Isaacs-Smith, A. Modic, M. Park, Y. Xu, E. L. Garfunkel, S. Dhar, L. C. Feldman, and J. R. Williams; High-Mobility Stable 4H-SiC MOSFETs Using a Thin PSG Interfacial Passivation Layer, IEEE Electron Device Letters, Vol. 34, No. 2, February (2013). Link
David M. Robinson, Yong Bok Go, Michelle Mui, Graeme Gardner, Zhijuan Zhang, Daniel Mastrogiovanni, Eric Garfunkel, Jing Li, Martha Greenblatt, and G. Charles Dismukes; Photochemical Water Oxidation by Crystalline Polymorphs of Manganese Oxides: Structural Requirements for Catalysis, J. Am. Chem. Soc., 135, 3494−3501 (2013). Link
Jinping Lai, Birju P. Shah, Eric Garfunkel, and Ki-Bum Lee; Versatile Fluorescence Resonance Energy Transfer-Based Mesoporous Silica Nanoparticles for Real-Time Monitoring of Drug Release, ACS Nano, Vol. 7, No. 3 2741–2750 (2013). Link
Kalyana C. Pingalia, Troy Shinbrotb, Alberto Cuitinoc, Fernando J. Muzzioa, Eric Garfunkeld, Yevgeny Lifshitze, and Adrian B. Mann; AFM study of hydrophilicity on acetaminophen crystals, International Journal of Pharmaceutics Volume 438, Issues 1–2, 15 November 2012, Pages 184–190 (2012). Link
Pavel Ivanoff Reyes, Chieh-Jen Ku, Ziqing Duan, Yi Xu, Eric Garfunkel, and Yicheng Lu; Reduction of persistent photoconductivity in ZnO thin film transistor-based UV photodetector, Applied Physics Letters 101, 031118 (2012). Link
Ziqing Duan, Aurelien Du Pasquier, Yicheng Lu, Yi Xu, and Eric Garfunkel; Effects of Mg composition on open circuit voltage of Cu2O–MgxZn1-xO heterojunction solar cells, Solar Energy Materials & Solar Cells, 96, 292–297 (2012). Link
Pui Lam Chiu, Daniel D. T. Mastrogiovanni, Dongguang Wei, Cassandre Louis, Min Jeong, Guo Yu, Peter Saad, Carol R. Flach, Richard Mendelsohn, Eric Garfunkel, and Huixin He; Microwave- and Nitronium Ion-Enabled Rapid and Direct Production of Highly Conductive Low-Oxygen Graphene, dx.doi.org/10.1021/ja210725p, J. Am. Chem. Soc. (2012). Link
Lauren Klein, Daniel Mastrogiovanni, Alan Wan and Eric Garfunkel; Nanowires - Fundamental Research: Growth of Germanium Nanowires on a Flexible Organic Substrate, InTech, ISBN 978-953-307-327-9, edited by Abbass Hashim (2011). Link
Hikmet Najafov, Daniel Mastrogiovanni, Eric Garfunkel, Leonard C. Feldman, and Vitaly Podzorov; Photon-Assisted Oxygen Diffusion and Oxygen-Related Traps in Organic Semiconductors, Advanced Materials, 23 981-985 (2011). Link
L.V. Goncharova, M. Dalponte, T. Feng, T. Gustafsson, E. Garfunkel, P.S. Lysaght, and G. Bersuker; Diffusion and interface growth in hafnium oxide and silicate ultrathin films on Si(001), Physical Review B, 83 115329 (2011). Link
Chieh-Jen Ku, Ziqing Duan, Pavel I. Reyes, Yicheng Lu, Yi Xu, Chien-Lan Hsueh, and Eric Garfunkel; Effects of Mg on the electrical characteristics and thermal stability of MgxZn1−xO thin film transistors, Applied Physics Letters, 98 123511 (2011). Link
B. Lee, A. Wan, D. Mastrogiovanni, J. E. Anthony, E. Garfunkel, and V. Podzorov; Origin of the bias stress instability in single-crystal organic field-effect transistors, Physical Review, 82 085302 (2010). Link
Xingguang Zhu, Hang Dong Lee, Tian Feng, Ayayi C. Ahyi, Daniel Mastrogiovanni, Alan Wan, Eric Garfunkel, John R. Williams, Torgny Gustafsson, and Leonard C. Feldman; Structure and stoichiometry of (0001) 4H–SiC/oxide interface, Applied Physics Letters, 97 071908 (2010). Link
S.A. Chambers, M.H. Engelhard, V. Shutthanandan, Z. Zhu, T.C. Droubay, L. Qiao, P.V. Sushko, T. Feng, H.D. Lee, T. Gustafsson, E. Garfunkel, A.B. Shah, J.-M. Zuo, Q.M. Ramasse; Instability, intermixing and electronic structure at the epitaxial LaAlO3/SrTiO3(001) heterojunction, Surface Science Reports, 65 317–352 (2010). Link
B. Lee, Y. Chen, F. Duerr, D. Mastrogiovanni, E. Garfunkel, E. Y. Andrei, and V. Podzorov; Modification of Electronic Properties of Graphene with Self-Assembled Monolayers, Nano Lett. DOI: 10.1021/nl100587e (2010). Link
Michele Vittadello, Maxim Y. Gorbunov, Daniel T. Mastrogiovanni, Leszek S. Wielunski, Eric L. Garfunkel, Fernando Guerrero, Diana Kirilovsky, Miwa Sugiura, A. William Rutherford, Ahmad Safari, Paul G. Falkowski; Photoelectron Generation by Photosystem II Core Complexes Tethered to Gold Surfaces, ChemSusChem, 3, No. 4, 471-475 (2010). Link
Leszek S. Wielunski, S. Katalinic, B. Lee, M. Connors c, E. Garfunkel, L.C. Feldman, V. Podzorov; Ion-scattering analysis of self-assembled monolayers of silanes on organic semiconductors, NIM B: Beam Interactions with Materials and Atoms, 268 1889–1892 (2010). Link
Ming Zhang, Rishi R. Parajuli, Daniel Mastrogiovanni, Boya Dai, Phil Lo, William Cheung, Roman Brukh, Pui Lam Chiu, Tao Zhou, Zhongfan Liu, Eric Garfunkel, and Huixin He; Production of Graphene Sheets by Direct Dispersion with Aromatic Healing Agents, Small, 6, No. 10, 1100-1107 (2010). Link
Cecilia Mattevi, Goki Eda, Stefano Agnoli, Steve Miller, K. Andre Mkhoyan, Ozgur Celik, Daniel Mastrogiovanni, Gaetano Granozzi, Eric Garfunkel, and Manish Chhowalla; Evolution of Electrical, Chemical, and Structural Properties of Transparent and Conducting Chemically Derived Graphene Thin Films, Adv. Funct. Mater., 19, 2577–2583 (2009). Link
M Dalponte, M C Adam, H I Boudinov, L V Goncharova, T Feng, Eric Garfunkel and T Gustafsson; Effect of excess vacancy concentration on As and Sb doping in Si, J. Phys. D: Appl. Phys. 42 165106 (2009). Link
Hang Dong Lee, Tian Feng, Lei Yu, Daniel Mastrogiovanni, Alan Wan, Torgny Gustafsson, and Eric Garfunkel; Reduction of native oxides on GaAs during atomic layer growth of Al 2O3, Applied Physics Letters 94, 222108 (2009). Link
Chi Yueh Kao, Bumsu Lee, Leszek S. Wielunski, Martin Heeney, Iain McCulloch, Eric Garfunkel, Leonard C. Feldman, and Vitaly Podzorov; Doping of Conjugated Polythiophenes with Alkyl Silanes, Advanced Functional Materials, 19, 1-6 (2009). Link
Sylvie Rangan, Eric Bersch, Robert Allen Bartynski, Eric Garfunkel and Elio Vescovo; Band offsets of a ruthenium gate on ultrathin high-κ oxide films on silicon, Physical Review B 79, 075106 (2009). Link
Sylvie Rangan, Eric Bersch, Robert Allen Bartynski, Eric Garfunkel and Elio Vescovo; GeOx interface layer reduction upon Al-gate deposition on a HfO2 /GeOx/Ge(001) stack, Appl. Phys. Lett. 92, 172906 (2008). Link
Eric Bersch, Sylvie Rangan, Robert Allen Bartynski, Eric Garfunkel and Elio Vescovo; Band offsets of ultrathin high-κ oxide films with Si, Physical Review B 78, 085114 (2008).
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Eric Garfunkel, Jacob Gavartin, Gennadi Bersuker; Defects in CMOS Gate Dielectrics, Defects in Microelectronic Materials and Devices: Edited by Daniel Fleetwood, Sokrates Pantolides, and Ronald D. Schrimpf, Published by CRC Press 2008 ISBN 1420043765 Chapter 11, pp 341-358.
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M. Dalponte, H. Boudinov, L.V. Goncharova, E. Garfunkel and T. Gustafsson; MEIS study of antimony implantation in SIMOX and vacancy-rich Si(1 0 0), J. Phys. D: Appl. Phys. 40 4222-4227 (2007).
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A. Du Pasquier, D.T. Mastrogiovanni, L.A. Klein, T. Wang, E. Garfunkel; Photoinduced charge transfer between poly(3-hexyl thiophene) and germanium nanowires, Appl. Phys. Lett. 91, (18) 183501 (2007). Link
N. Goel, W. Tsai, C. M. Garner, Y. Sun, P. Pianetta, M. Warusawithana, D. G. Schlom, H. Wen, C. Gaspe, J. C. Keay, M. B. Santos, L. V. Goncharova, E. Garfunkel, and T. Gustafsson; Band offsets between amorphous LaAlO3 and In0.53Ga0.47As, Appl. Phys. Lett. 91, 113515 (2007). Link
L. V. Goncharova, M. Dalponte, T. Gustafsson, O. Celik, E. Garfunkel, P. S. Lysaght and G. Bersuker; Metal-gate-induced reduction of the interfacial layer in Hf oxide gate stacks, J. Vac. Sci. Tech. A 25, 261 (2007). Link
W. Jiang, E. Garfunkel, N. Zhitenev, D. Abusch-Magder, D. Tennant, Z. Bao; Molecular conductance measurements through printed Au nanodots, Appl. Phys. Lett. 89, (11) 113107 (2006). Link
C.M. Osburn, et al; Materials and Processes for High k Gate Stacks: Results from the FEP Transition Center, ECS Transactions, 3, (3) 389 (2006).  
E. Garfunkel, T. Gustafsson, P. Lysaght, S. Stemmer, R. Wallace; Atomic Scale Materials Characterization Clallenges in Advanced CMOS Gate Stacks, Future FAB International 21, 126 (2006). Link
N.B. Zhitenev, W. Jiang, A. Erbe, Z. Bao, E. Garfunkel, D.M. Tennant, R. Cirelli; Control of topography, stress and diffusion at molecule–metal interfaces, Nanotechnology 17, p. 1272-1277 (2006). Link
L.V. Goncharova, D.G. Starodub, E. Garfunkel, T. Gustafsson, V. Vaithyanathan, J. Lettieri, D.G. Schlom; Interface structure and thermal stability of epitaxial SrTiO3 thin films on Si(001), J. Appl. Phys. 100, 014912 (2006). Link
R. Barnes, D. Starodub, T. Gustafsson, E. Garfunkel; A medium energy ion scattering and x-ray photoelectron spectroscopy study of physical vapor deposited thin cerium oxide films on Si(100), J. Appl. Phys. 100, 044103 (2006). Link
L.V. Goncharova, M. Dalponte, D.G. Starodub, T. Gustafsson, E. Garfunkel, P.S. Lysaght, B. Foran, J. Barnett, G. Bersuker; Oxygen diffusion and reactions in Hf-based dielectrics, J. Appl. Phys. 89, 044108 (2006). Link
B. Chen, R. Jha, H. Lazar, N. Biswas, J. Lee, B. Lee, L. Wielunski, E. Garfunkel, V. Misra; Influence of Oxygen Diffusion Through Capping Layers of Low Work Function Metal Gate Electrodes, IEEE Electron Device Letters 27, (4) p. 228-230 (2006). Link
A. Erbe, W. Jiang, Z. Bao, E. Garfunkel, N. Zhitenev; Nanoscale patterning in application to materials and device structures, J. Vac. Sci. Technol. B 23, (6), p. 3132-3137 (2005). Link
M. Hong, A. R. Kortan, P. Chang, Y. L. Huang, C. P. Chen, H. Y. Chou, H. Y. Lee, J. Kwo, M.-W. Chu, C. H. Chen, L. V. Goncharova, E. Garfunkel, and T. Gustafsson; High-quality nanothickness single-crystal Sc2O3 film grown on Si(111), Appl. Phys. Lett. 87, 251902 (2005). Link
S. Sayan, N.V. N guyen, J. Ehrstein, J.J. Chambers, M.R. Visokay, M.A. Quevedo-Lopez, L. Colombo, D. Yoder, I. Levin, D.A. Fischer, M. Paunescu, O. Celik, E. Garfunkel; Effect of nitrogen on band alignment in HfSiON gate dielectrics, Appl. Phys. Lett. 87 (21), 212905 (2005). Link
D.J. Lichtenwalner, J.S. Jur, A.I. Kingon, M.P. Agustin, Y. Yang, S. Stemmer, L.V. Goncharova, T. Gustafsson, E. Garfunkel; Lanthanum silicate gate dielectric stacks with subnanometer equivalent oxide thickness utilizing an interfacial silica consumption reaction, J. Appl. Phys. 98 (2), 024314 (2005). Link
P.L. Grande, A. Hentz, G. Schiwietz, D. Starodub, E. Garfunkel, T. Gustafsson; Observation of collective inner-shell effects for protons backscattered from the Al(110) surface, Phys. Rev. A 72 (1), 012902 (2005). Link
W. Jiang, N.B. Zhitenev, Z. Bao, H. Meng, D. Abusch-Magder, D. Tennant, E. Garfunkel; Structure and bonding issues at the interface between gold and self-assembled conjugated dithiol monolayers, Langmuir 21 p. 8751-8757 (2005). Link
Martin M. Frank, Glen D. Wilk, Dmitri Starodub, Torgny Gustafsson, Eric Garfunkel, Yves J. Chabal, John Grazul and David A. Muller; HfO2 and Al2O3 gate dielectrics on GaAs grown by atomic layer deposition, Appl. Phys. Lett. 86, 152904 (2005). Link
S. Sayan, N. V. Nguyen, J. Ehrstein, T. Emge, E. Garfunkel, M. Croft, Xinyuan Zhao, David Vanderbilt, I. Levin, E. P. Gusev, Hyoungsub Kim and P. J. McIntyre; Structural, electronic, and dielectric properties of ultrathin zirconia films on silicon, Appl. Phys. Lett. 86, 152902 (2005). Link
Annelies Delabie, et al; Atomic layer deposition of hafnium oxide on germanium substrates, J. Appl. Phys. 97, 064104 (2005). Link
Nikolai B Zhitenev, Artur Erbe, Zhenan Bao, Weirong Jiang and Eric Garfunkel, Molecular nano-junctions formed with different metallic electrodes, Nanotechnology, 16, (2005) 1-6. Link
M. Dalponte, H. Boudinov, L. V. Goncharova, D. Starodub, E. Garfunkel, and T. Gustafsson, Thermal activation of As implanted in bulk Si and separation by implanted oxygen, J. Appl. Phys., 96, 7388 (2004). Link
S. Sayan, R. A. Bartynski, X. Zhao, E. P. Gusev, D. Vanderbilt, M. Croft, M. Banaszak Holl, and E. Garfunkel, Valence and conduction band offsets of a ZrO2/SiOxNy/n-Si CMOS gate stack: A combined photoemission and inverse photoemission study, Phys. Stat. Sol. B, 241, No. 10, p2246–2252 (2004). Link
S. Sayan, T. Emge, E. Garfunkel, et al, Band alignment issues related to HfO2 /SiO2 /p-Si gate stacks, J. Appl. Phys. 96 (9), p7485 (2004). Link
D. Starodub, T. Gustafsson and E. Garfunkel; The reaction of O2 with Al(110): a medium energy ion scattering study of nano-scale oxidation, Surf. Sci. 552, 199 (2004). Link
S. Dhar, Y. W. Song, L. C. Feldman, T. Isaacs-Smith, C. C. Tin, and J. R. Williams, G. Chung, T. Nishimura, D. Starodub, T. Gustafsson, and E. Garfunkel; Effect of nitric oxide annealing on the interface trap density near the conduction bandedge of 4H-SiC at the oxide/(112) 4H-SiC interface; Appl. Phys. Lett. 84(9) p1498 (2004). Link
Joseph H. Han, Guilian Gao, Yuniarto Widjaja, Eric Garfunkel, Charles B. Musgrave; A quantum chemical study of ZrO2 atomic layer deposition growth reactions on the SiO2 surface; Surface Science 550, 199 (2004). Link
Martin M. Frank, Safak Sayan, Sabine Dormann, Thomas J. Emge, Leszek S. Wielunski, Eric Garfunkel, Yves J. Chabal; Hafnium oxide gate dielectrics grown from an alkoxide precursor: structure and defects; Materials Science and Engineering B, 109, (1-3), 15 June 2004, Pages 6-10. Link
Isaac M. Rutenberg, Oren A. Scherman, Robert H. Grubbs, Weirong Jiang, Eric Garfunkel, and Zhenan Bao; Synthesis of Polymer Dielectric Layers for Organic Thin Film Transistors via Surface-Initiated Ring-Opening Metathesis Polymerization, J. Am. Chem. Soc. Comm. 126, 2064 (2004). Link
Bert de Boer, Martin M. Frank, Yves J. Chabal, Weirong Jiang, Eric Garfunkel, Zhenan Bao, Metallic Contact Formation for Molecular Electronics: Interactions between Vapor-Deposited Metals and Self-Assembled Monolayers of Conjugated Mono- and Dithiols, Langmuir, 20(5), 1539 (2004). Link
J. Zhong, S. Muthukumar, Y. Chen, and Y. Lu, H.M. Ng, W. Jiang and E.L. Garfunkel, Ga-doped ZnO single-crystal nanotips grown on fused silica by metal-organic chemical vapor deposition, Appl. Phys. Lett 83 (16), 3401 (2003). Link
S. Sayan, E. Garfunkel, T. Nishimura, W.H. Schulte T. Gustafsson. G. Wilk, Thermal decomposition behavior of the HfO2/SiO2/Si system, J. Appl. Phys. 94 (2) 928 (2003). Link
S. Suzer, S. Sayan, M.M.B. Holl, E. Garfunkel, Z. Hussain, N.M. Hamdan, Soft x-ray photoemission studies of Hf oxidationJ, Vac. Sci. Tech. A 21(1) 106 (2003). Link
W. Tsai, R.J. Carter, H. Nohira, M. Caymax, T. Conard, W. Cosnier, S. DeGendt, M. Heyns, J. Petry, O. Richard, W. Vandervorst, E. Young, C. Zhao, J. Maes, M. Tuominen, W.H. Schulte, E. Garfunkel, T. Gustafsson, Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition Microelectr. Eng. 65(3) 259 (2003). Link
J. Kwo, M. Hong, B. Busch, D.A. Muller, Y.J. Chabal, A.R. Kortan, J.P. Mannaerts, B. Yang, P. Ye, H. Gossmann, A.M. Sergent, K.K. Ng, J. Bude, W.H. Schulte, E. Garfunkel, T. Gustafsson, Advances in high kappa gate dielectrics for Si and III-V semiconductors, Cryst. Growth; 251(1-4) 645 (2003). Link
G.D. Wilk, M.L. Green, M.-Y. Ho, B.W. Busch, T.W. Sorsch, F.P. Klemens, B. Brijs, R.B. van Dover, A. Kornblit, T. Gustafsson, E. Garfunkel, S. Hillenius, D. Monroe, P. Kalavade, J.M. Hergenrother; Improved film growth and flatband voltage control of ALD HfO2 and Hf-Al-O with n+ poly-Si gates using chemical oxides and optimized post-annealing; VLSI Technology Symposium, Digest of Technical Papers, p88 (2002).  
Y.J. Chabal, K. Ragavachari, X. Zhang and E. Garfunkel Silanone (Si=O) on Si(100): intermediate for initial silicon oxidation, Phys. Rev. B; 66161315 (2002). Link
B.W. Busch, O. Pluchery, Y.J. Chabal, D.A. Muller, R.L. Opila, J.R. Kwo, Garfunkel E, Materials characterization of alternative gate dielectrics, invited review, MRS Bulletin, 27 (3), 206 (2002). Link
S. Sayan, S. Aravamudhan, B.W. Busch, W.H. Schulte, F. Cosandey, G.D. Wilk, T. Gustafsson, E. Garfunkel, Chemical vapor deposition of HfO2 films on Si(100), J. Vac. Sci. Tech. A20 (2), 507 (2002). Link
S. Sayan, E. Garfunkel, S. Suzer, Soft x-ray photoemission studies of the HfO2/SiO2/Si system, Appl. Phys. Lett. 80 (12), 2135 (2002). Link
J. Kwo, B. Busch, D. A. Muller, M. Hong, Y. J. Chabal, L. Manchanda, A. R. Kortan, J. P. Mannaerts, T. Boone, W. H. Schulte, E. Garfunkel, and T. Gustafsson; High-k Y2O3 and Gd2O3 Gate Stacks: A Vehicle for Critical Materials Integration Issues; Proceedings IEDM Symposium, (2001).  
W.H. Schulte, E. Garfunkel and T. Gustafsson, I. Baumvol, E. Gusev, Ion Beam Studies of Silicon Oxidation and Oxynitridation, chapter, Ed: Y. Chabal, Springer Verlag, (2001).  
M. L. Green, E. P. Gusev, R. Degraeve, and E. L. Garfunkel, Ultrathin SiO2 and Si-O-N Gate Dielectric Layers for Silicon Microelectronics: Understanding the Processing, Structure, and Physical and Electrical Limits, invited review, J. Appl. Phys. 90 (5) 2057 (2001). Link
X. Zhang, Y.J. Chabal, S.B. Christman, E.E. Chaban, E. Garfunkel, Oxidation of H-covered flat and vicinal Si(111)-1x1 surfaces, J. Vac. Sci. Tech. A19 (4) 1725, (2001). Link
J. J. Chambers, B. W. Busch, W.H. Schulte, T. Gustafsson and E. Garfunkel, S. Wang and D. M. Maher, T. M. Klein, G. N. Parsons, Effects of surface pretreatments on interface structure during formation of ultra-thin yttrium silicate dielectric films on silicon, accepted, Appl. Surf. Sci., 181, 78 (2001). Link
J-P. Maria, D. Wicaksana, A. I. Kingon, B.W. Busch, W.H. Schulte, T. Gustafsson, and E. Garfunkel, High temperature stability in lanthanum-based and zirconium-based gate dielectrics, accepted, J. Appl. Phys. 90, 3476 (2001). Link
H.C. Lu, E.P. Gusev, E. Garfunkel, B.W. Busch, T. Gustafsson, T. Sorch, and M.L. Green, Isotopic Labeling Studies of Interactions of Nitric Oxide and Nitrous Oxide with Ultrathin Oxynitride Layers on Silicon, Journal of Applied Physics, 87, p1550, (2000). Link
H. C. Lu, E. Gusev, N. Yasuda, M. Green, G. Alers, E. Garfunkel and T. Gustafsson, Growth chemistry and interfacial properties of Si oxynitride and metal oxide ultrathin films on Si, Appl. Surf. Sci., 166, 465 (2000).  
B.W. Busch, W.H. Schulte, E. Garfunkel, T. Gustafsson, W. Qi, R. Nieh and J. Lee, Oxygen Exchange and Transport in Thin Zirconia Films on Si(100), Phys. Rev. B 62(20), 13,290 (2000). Link
E.P. Gusev, H.C. Lu, E. Garfunkel, T. Gustafsson, and M.L. Green, Growth and Characterization of Ultrathin Nitrided Oxide Films, IBM Journal of Research and Development, (invited) 43, 265 (1999).  
A.C. Diebold, D. Venables, Y. Chabal, D. Muller, M. Weldon, and E. Garfunkel, Characterization and production metrology of thin transistor gate oxide films, Materials Science in semiconductor Processing, invited review, 2, 103 (1999). Link
L.C. Feldman, E.P. Gusev, and E. Garfunkel, “Ultrathin Dielectrics in Si Microelectronics” in Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices, edited by E. Garfunkel, E. Gusev and A. Vul’, Kluwer Acad. Publisher, p39, (1998).  
Edited Book: Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices, Eds. E. Garfunkel, E. Gusev, A. Vul’, Kluwer Academic Publishers, NATO Science Series, (1998).

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